GE.I 

IMAGING AND NANOFABRICATION IN RESEARCH FOR ELECTRONICS RELATED COMPONENTS

September 18

The aim of the workshop is to highlight progress in research and technology related to microelectronics and novel structures where imaging and nanofabrication are indispensable methods steering the applications of these advanced devices. Over the workshop day, you can look forward to Latest technology insights from ZEISS, Kleindiek and Raith, Inspiring user presentations, a Get-together after the workshop for your networking.
Learn more about the workshop & book your place in presence at https://www.zeiss.it/microscopia/local/eventi/nanoinnovation_workshop.html
The number of participant will be limit at 120 and the place will be reserved on the basis of first booked first served.
If the above limit is reached, the possibility of online participation will be activated.

Innovative research using nanofabrication plays crucial role in advancing manufacturing of new components for microelectronics and in development of novel devices based on nanostructures, nanophotonics or complex semiconductor integrated systems. Importantly, high-quality high- resolution imaging gives insights in the development process at each of the many steps to guide the researchers towards achieving their final goals. The aim of the workshop is to highlight progress in research and technology related to microelectronics and novel structures where imaging and nanofabrication are indispensable methods steering the applications of variety of novel advanced devices.

Topics:
FE-SEM imaging and related techniques for electronics
FIB-SEM workflows for electronics
e-beam and i-beam nanolithography
Microelectronics
Integrated nanophotonics
Single electronics
Quantum information science
Semiconductor Nanostructures for novel devices in electronics
Inspection and failure analysis in electronics
Nanoprobing
Semiconductor lasers, optical interconnects

The participation is free, but the registration on the website of Nanoinnovation is mandatory.